Impact of etching on the surface leakage generation in mesa-type InGaAs/InAlAs avalanche photodetectors | |
Ma, Yingjie; Zhang, Yonggang; Gu, Yi; Chen, Xingyou; Shi, Yanhui; Ji, Wanyan; Xi, Suping; Du, Ben; Li, Xiaoliang; Tang, Hengjing | |
刊名 | OPTICS EXPRESS |
2016 | |
卷号 | 24期号:7页码:7823-7834 |
DOI | 10.1364/OE.24.007823 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4713354 |
专题 | 山东大学 |
作者单位 | Chinese Acad Sci, Shanghai Inst Mic |
推荐引用方式 GB/T 7714 | Ma, Yingjie,Zhang, Yonggang,Gu, Yi,et al. Impact of etching on the surface leakage generation in mesa-type InGaAs/InAlAs avalanche photodetectors[J]. OPTICS EXPRESS,2016,24(7):7823-7834. |
APA | Ma, Yingjie.,Zhang, Yonggang.,Gu, Yi.,Chen, Xingyou.,Shi, Yanhui.,...&Geng D.(2016).Impact of etching on the surface leakage generation in mesa-type InGaAs/InAlAs avalanche photodetectors.OPTICS EXPRESS,24(7),7823-7834. |
MLA | Ma, Yingjie,et al."Impact of etching on the surface leakage generation in mesa-type InGaAs/InAlAs avalanche photodetectors".OPTICS EXPRESS 24.7(2016):7823-7834. |
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