| Chemical Reaction Thermodynamic Model of Low Pressure CVD for Nano-TiO2 Film Preparation | |
| Li, Tao; Yang, Junfeng; Zhang, Hong-Chao; Yuan, Chris | |
| 2012 | |
| 会议名称 | IEEE International Symposium on Sustainable Systems and Technology (ISSST) |
| 会议日期 | 2012-01-01 |
| 会议地点 | Boston, MA |
| 关键词 | Low Pressure Chemical Vapor Deposition Nano-TiO2 film Thermodynamic model Energy efficiency |
| 会议录 | IEEE International Symposium on Sustainable Systems and Technology (ISSST)
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| URL标识 | 查看原文 |
| 内容类型 | 会议论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/4671640 |
| 专题 | 大连理工大学 |
| 作者单位 | 1.Dalian Univ Technol, Sch Mech Engn, Dalian 116024, Peoples R China. 2.Univ Wisconsin, Dept Mech Engn, Milwaukee, WI 53201 USA. |
| 推荐引用方式 GB/T 7714 | Li, Tao,Yang, Junfeng,Zhang, Hong-Chao,et al. Chemical Reaction Thermodynamic Model of Low Pressure CVD for Nano-TiO2 Film Preparation[C]. 见:IEEE International Symposium on Sustainable Systems and Technology (ISSST). Boston, MA. 2012-01-01. |
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