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	Deposition, microstructure and hardness of TiN/(Ti,Al)N multilayer films
	Zhao, Y. H.; Hu, L.; Lin, G. Q.; Xiao, J. Q.; Dong, C.; Yu, B. H.
刊名	INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS
	2012
卷号	32页码:27-32
关键词	Pulse biased arc ion plating TiN/(Ti,Al)N multilayer films TEM Hardness
ISSN号	0263-4368
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4668217
专题	大连理工大学
作者单位	1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China. 2.Dalian Univ Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China.
推荐引用方式 GB/T 7714	Zhao, Y. H.,Hu, L.,Lin, G. Q.,et al. Deposition, microstructure and hardness of TiN/(Ti,Al)N multilayer films[J]. INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS,2012,32:27-32.
APA	Zhao, Y. H.,Hu, L.,Lin, G. Q.,Xiao, J. Q.,Dong, C.,&Yu, B. H..(2012).Deposition, microstructure and hardness of TiN/(Ti,Al)N multilayer films.INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS,32,27-32.
MLA	Zhao, Y. H.,et al."Deposition, microstructure and hardness of TiN/(Ti,Al)N multilayer films".INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS 32(2012):27-32.

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