Flat Boron: A New Cousin of Graphene. | |
Sheng-Yi Xie; Yeliang Wang; Xian-Bin Li | |
刊名 | Advanced materials (Deerfield Beach, Fla.) |
2019 | |
页码 | e1900392 |
关键词 | 2D materials borophene borophene synthesis |
ISSN号 | 1521-4095 |
URL标识 | 查看原文 |
公开日期 | [db:dc_date_available] |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4608785 |
专题 | 湖南大学 |
作者单位 | School of Physics and Electronics, Hunan University, Changsha, 410082, China. School of Information and Electronics, Beijing Institute of Technology, Beijing, 100081, China. State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China. |
推荐引用方式 GB/T 7714 | Sheng-Yi Xie,Yeliang Wang,Xian-Bin Li. Flat Boron: A New Cousin of Graphene.[J]. Advanced materials (Deerfield Beach, Fla.),2019:e1900392. |
APA | Sheng-Yi Xie,Yeliang Wang,&Xian-Bin Li.(2019).Flat Boron: A New Cousin of Graphene..Advanced materials (Deerfield Beach, Fla.),e1900392. |
MLA | Sheng-Yi Xie,et al."Flat Boron: A New Cousin of Graphene.".Advanced materials (Deerfield Beach, Fla.) (2019):e1900392. |
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