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Effects of substrate temperature on the structure and photoelectrical properties of ZnO films prepared via sputtering
Fan, Xiaoling; Liu, Juncheng; Zhai, Shenqiu; Ding, Rui
刊名JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS
2017
卷号19期号:7-8页码:511-516
关键词ZnO Thin film Substrate temperature RF magnetron sputtering Photoelectrical property
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公开日期[db:dc_date_available]
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/4585068
专题山东大学
作者单位1.Shandong Univ Technol, Sch Mat Sci & Engn, Zibo 255049, Peoples R China.
2.J
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GB/T 7714
Fan, Xiaoling,Liu, Juncheng,Zhai, Shenqiu,et al. Effects of substrate temperature on the structure and photoelectrical properties of ZnO films prepared via sputtering[J]. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS,2017,19(7-8):511-516.
APA Fan, Xiaoling,Liu, Juncheng,Zhai, Shenqiu,&Ding, Rui.(2017).Effects of substrate temperature on the structure and photoelectrical properties of ZnO films prepared via sputtering.JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS,19(7-8),511-516.
MLA Fan, Xiaoling,et al."Effects of substrate temperature on the structure and photoelectrical properties of ZnO films prepared via sputtering".JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 19.7-8(2017):511-516.
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