Effects of substrate temperature on the structure and photoelectrical properties of ZnO films prepared via sputtering | |
Fan, Xiaoling; Liu, Juncheng; Zhai, Shenqiu; Ding, Rui | |
刊名 | JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS
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2017 | |
卷号 | 19期号:7-8页码:511-516 |
关键词 | ZnO Thin film Substrate temperature RF magnetron sputtering Photoelectrical property |
URL标识 | 查看原文 |
公开日期 | [db:dc_date_available] |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4585068 |
专题 | 山东大学 |
作者单位 | 1.Shandong Univ Technol, Sch Mat Sci & Engn, Zibo 255049, Peoples R China. 2.J |
推荐引用方式 GB/T 7714 | Fan, Xiaoling,Liu, Juncheng,Zhai, Shenqiu,et al. Effects of substrate temperature on the structure and photoelectrical properties of ZnO films prepared via sputtering[J]. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS,2017,19(7-8):511-516. |
APA | Fan, Xiaoling,Liu, Juncheng,Zhai, Shenqiu,&Ding, Rui.(2017).Effects of substrate temperature on the structure and photoelectrical properties of ZnO films prepared via sputtering.JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS,19(7-8),511-516. |
MLA | Fan, Xiaoling,et al."Effects of substrate temperature on the structure and photoelectrical properties of ZnO films prepared via sputtering".JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 19.7-8(2017):511-516. |
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