| Ferromagnetic resonance of facing-target sputtered epitaxial γ′-Fe4N films: The influence of thickness and substrates | |
| Lai, Zhengxun; Li, Zirun; Liu, Xiang; Bai, Lihui; Tian, Yufeng; Mi, Wenbo | |
| 刊名 | Journal of Physics D: Applied Physics
 |
| 2018 | |
| 卷号 | 51期号:24 |
| DOI | 10.1088/1361-6463/aac2a2 |
| URL标识 | 查看原文 |
| 公开日期 | [db:dc_date_available] |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/4574216 |
| 专题 | 山东大学 |
| 作者单位 | Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparation Technology, School of S |
| 推荐引用方式 GB/T 7714 | Lai, Zhengxun,Li, Zirun,Liu, Xiang,et al. Ferromagnetic resonance of facing-target sputtered epitaxial γ′-Fe4N films: The influence of thickness and substrates[J]. Journal of Physics D: Applied Physics,2018,51(24). |
| APA | Lai, Zhengxun,Li, Zirun,Liu, Xiang,Bai, Lihui,Tian, Yufeng,&Mi, Wenbo.(2018).Ferromagnetic resonance of facing-target sputtered epitaxial γ′-Fe4N films: The influence of thickness and substrates.Journal of Physics D: Applied Physics,51(24). |
| MLA | Lai, Zhengxun,et al."Ferromagnetic resonance of facing-target sputtered epitaxial γ′-Fe4N films: The influence of thickness and substrates".Journal of Physics D: Applied Physics 51.24(2018). |
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