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	Spontaneous polarization enhancement in ferroelectric Hf0.5Zr0.5O2 using atomic oxygen defects engineering: An ab initio study
	Wei, Wei; Ma, Xiaolei; Wu, Jixuan; Wang, Fei; Zhan, Xuepeng; Li, Yuan; Chen, Jiezhi
刊名	APPLIED PHYSICS LETTERS
	2019
卷号	115期号:9
DOI	10.1063/1.5115293
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4557414
专题	山东大学
作者单位	Shandong Univ, Sch Informat Sci & Engn, Qingdao 266237, Shandong
推荐引用方式 GB/T 7714	Wei, Wei,Ma, Xiaolei,Wu, Jixuan,et al. Spontaneous polarization enhancement in ferroelectric Hf0.5Zr0.5O2 using atomic oxygen defects engineering: An ab initio study[J]. APPLIED PHYSICS LETTERS,2019,115(9).
APA	Wei, Wei.,Ma, Xiaolei.,Wu, Jixuan.,Wang, Fei.,Zhan, Xuepeng.,...&Chen, Jiezhi.(2019).Spontaneous polarization enhancement in ferroelectric Hf0.5Zr0.5O2 using atomic oxygen defects engineering: An ab initio study.APPLIED PHYSICS LETTERS,115(9).
MLA	Wei, Wei,et al."Spontaneous polarization enhancement in ferroelectric Hf0.5Zr0.5O2 using atomic oxygen defects engineering: An ab initio study".APPLIED PHYSICS LETTERS 115.9(2019).

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