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	Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF4 Plasma Using Optical Emission Spectroscopy
	Liu Wenyao; Zhu Aimin; Li Xiaosong; Zhao Guoli; Lu Wenqi; Xu Yong; Wang Younian
刊名	PLASMA SCIENCE & TECHNOLOGY
	2013
卷号	15页码:885-890
关键词	dual-frequency capacitively coupled plasma (DF CCP) gas temperature electron temperature fluorine atom concentration
ISSN号	1009-0630
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4541038
专题	大连理工大学
作者单位	1.Dalian Univ Technol, Lab Plasma Phys Chem, Dalian 116024, Peoples R China. 2.Dalian Univ Technol, Lab Plasma Phys Chem, Dalian 116024, Peoples R China. 3.Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China. 4.Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China.
推荐引用方式 GB/T 7714	Liu Wenyao,Zhu Aimin,Li Xiaosong,et al. Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF4 Plasma Using Optical Emission Spectroscopy[J]. PLASMA SCIENCE & TECHNOLOGY,2013,15:885-890.
APA	Liu Wenyao.,Zhu Aimin.,Li Xiaosong.,Zhao Guoli.,Lu Wenqi.,...&Wang Younian.(2013).Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF4 Plasma Using Optical Emission Spectroscopy.PLASMA SCIENCE & TECHNOLOGY,15,885-890.
MLA	Liu Wenyao,et al."Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF4 Plasma Using Optical Emission Spectroscopy".PLASMA SCIENCE & TECHNOLOGY 15(2013):885-890.

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