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	Chemical Mechanical Polishing Slurries for Chemically Vapor-Deposited Diamond Films
	Yuan, Zewei; Jin, Zhuji; Zhang, Youjun; Wen, Quan
刊名	JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASME
	2013
卷号	135页码:-
关键词	CVD diamond film thermokinetics chemical mechanical polishing slurry oxidant
ISSN号	1087-1357
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4540737
专题	大连理工大学
作者单位	1.Shenyang Univ Technol, Sch Mech Engn, Shenyang 110870, Peoples R China. 2.Dalian Univ Technol, Minist Educ, Key Lab Precis & Nontradit Machining Technol, Dalian 116024, Peoples R China.
推荐引用方式 GB/T 7714	Yuan, Zewei,Jin, Zhuji,Zhang, Youjun,et al. Chemical Mechanical Polishing Slurries for Chemically Vapor-Deposited Diamond Films[J]. JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASME,2013,135:-.
APA	Yuan, Zewei,Jin, Zhuji,Zhang, Youjun,&Wen, Quan.(2013).Chemical Mechanical Polishing Slurries for Chemically Vapor-Deposited Diamond Films.JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASME,135,-.
MLA	Yuan, Zewei,et al."Chemical Mechanical Polishing Slurries for Chemically Vapor-Deposited Diamond Films".JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASME 135(2013):-.

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