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	Role of rapid and slow cooling on leakage mechanism and ferroelectric polarization of sputtered epitaxial BiFeO3 thin films
	Zhu, Hanfei; Ma, Hongfang; Zhao, Yuyao
刊名	Vacuum
	2019
卷号	163页码:312-316
DOI	10.1016/j.vacuum.2019.02.040
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4535908
专题	山东大学
作者单位	Institute of Advanced Energy Materials and Chemistry, School of Chemistry and Pharmaceutical Engineering, Qilu University of Technology
推荐引用方式 GB/T 7714	Zhu, Hanfei,Ma, Hongfang,Zhao, Yuyao. Role of rapid and slow cooling on leakage mechanism and ferroelectric polarization of sputtered epitaxial BiFeO3 thin films[J]. Vacuum,2019,163:312-316.
APA	Zhu, Hanfei,Ma, Hongfang,&Zhao, Yuyao.(2019).Role of rapid and slow cooling on leakage mechanism and ferroelectric polarization of sputtered epitaxial BiFeO3 thin films.Vacuum,163,312-316.
MLA	Zhu, Hanfei,et al."Role of rapid and slow cooling on leakage mechanism and ferroelectric polarization of sputtered epitaxial BiFeO3 thin films".Vacuum 163(2019):312-316.

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