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	Effect of Zr Concentration on Microstructure and Discharge Properties of Mg-Zr-O Films Deposited by Magnetron Sputtering
	Wang Jianfeng; Wu Huiyan; Song Zhongxiao; Ma Dayan; Xu Kewei; Liu Chunliang
刊名	RARE METAL MATERIALS AND ENGINEERING
	2011
卷号	40期号:[db:dc_citation_issue]页码:339-342
关键词	magnetron sputtering Mg-Zr-O film discharge properties microstructure plasma display panel
ISSN号	1002-185X
DOI	[db:dc_identifier_doi]
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4483629
专题	西安交通大学
推荐引用方式 GB/T 7714	Wang Jianfeng,Wu Huiyan,Song Zhongxiao,et al. Effect of Zr Concentration on Microstructure and Discharge Properties of Mg-Zr-O Films Deposited by Magnetron Sputtering[J]. RARE METAL MATERIALS AND ENGINEERING,2011,40([db:dc_citation_issue]):339-342.
APA	Wang Jianfeng,Wu Huiyan,Song Zhongxiao,Ma Dayan,Xu Kewei,&Liu Chunliang.(2011).Effect of Zr Concentration on Microstructure and Discharge Properties of Mg-Zr-O Films Deposited by Magnetron Sputtering.RARE METAL MATERIALS AND ENGINEERING,40([db:dc_citation_issue]),339-342.
MLA	Wang Jianfeng,et al."Effect of Zr Concentration on Microstructure and Discharge Properties of Mg-Zr-O Films Deposited by Magnetron Sputtering".RARE METAL MATERIALS AND ENGINEERING 40.[db:dc_citation_issue](2011):339-342.

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