Wrinkle-dependent hydrogen etching of chemical vapor deposition-grown graphene domains | |
Wang, Bin; Zhang, Yanhui; Zhang, Haoran; Chen, Zhiying; Xie, Xiaoming; Sui, Yanping; Li, Xiaoliang; Yu, Guanghui; Hu, Lizhong; Jin, Zhi | |
刊名 | CARBON
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2014 | |
卷号 | 70页码:75-80 |
ISSN号 | 0008-6223 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4426376 |
专题 | 大连理工大学 |
作者单位 | 1.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China. 2.Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China. 3.Chinese Acad Sci, Inst Microelect, Microwave Devices & Integrated Circuits Dept, Beijing 100029, Peoples R China. |
推荐引用方式 GB/T 7714 | Wang, Bin,Zhang, Yanhui,Zhang, Haoran,et al. Wrinkle-dependent hydrogen etching of chemical vapor deposition-grown graphene domains[J]. CARBON,2014,70:75-80. |
APA | Wang, Bin.,Zhang, Yanhui.,Zhang, Haoran.,Chen, Zhiying.,Xie, Xiaoming.,...&Liu, Xinyu.(2014).Wrinkle-dependent hydrogen etching of chemical vapor deposition-grown graphene domains.CARBON,70,75-80. |
MLA | Wang, Bin,et al."Wrinkle-dependent hydrogen etching of chemical vapor deposition-grown graphene domains".CARBON 70(2014):75-80. |
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