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	Wrinkle-dependent hydrogen etching of chemical vapor deposition-grown graphene domains
	Wang, Bin; Zhang, Yanhui; Zhang, Haoran; Chen, Zhiying; Xie, Xiaoming; Sui, Yanping; Li, Xiaoliang; Yu, Guanghui; Hu, Lizhong; Jin, Zhi
刊名	CARBON
	2014
卷号	70页码:75-80
ISSN号	0008-6223
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4426376
专题	大连理工大学
作者单位	1.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China. 2.Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China. 3.Chinese Acad Sci, Inst Microelect, Microwave Devices & Integrated Circuits Dept, Beijing 100029, Peoples R China.
推荐引用方式 GB/T 7714	Wang, Bin,Zhang, Yanhui,Zhang, Haoran,et al. Wrinkle-dependent hydrogen etching of chemical vapor deposition-grown graphene domains[J]. CARBON,2014,70:75-80.
APA	Wang, Bin.,Zhang, Yanhui.,Zhang, Haoran.,Chen, Zhiying.,Xie, Xiaoming.,...&Liu, Xinyu.(2014).Wrinkle-dependent hydrogen etching of chemical vapor deposition-grown graphene domains.CARBON,70,75-80.
MLA	Wang, Bin,et al."Wrinkle-dependent hydrogen etching of chemical vapor deposition-grown graphene domains".CARBON 70(2014):75-80.

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