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	Competition of Hg2+ adsorption and surface oxidation on MoS2 surface as affected by sulfur vacancy defects
	Yi, Hao; Zhang, Xian; Jia, Feifei; Wei, Zhenlun; Zhao, Yunliang; Song, Shaoxian
刊名	Applied Surface Science
	2019
卷号	483
ISSN号	0169-4332
DOI	10.1016/j.apsusc.2019.03.350
URL标识	查看原文
收录类别	EI
语种	英语
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4241741
专题	武汉大学
推荐引用方式 GB/T 7714	Yi, Hao,Zhang, Xian,Jia, Feifei,et al. Competition of Hg2+ adsorption and surface oxidation on MoS2 surface as affected by sulfur vacancy defects[J]. Applied Surface Science,2019,483.
APA	Yi, Hao,Zhang, Xian,Jia, Feifei,Wei, Zhenlun,Zhao, Yunliang,&Song, Shaoxian.(2019).Competition of Hg2+ adsorption and surface oxidation on MoS2 surface as affected by sulfur vacancy defects.Applied Surface Science,483.
MLA	Yi, Hao,et al."Competition of Hg2+ adsorption and surface oxidation on MoS2 surface as affected by sulfur vacancy defects".Applied Surface Science 483(2019).

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