Controlling Injection Barriers for Ambipolar 2D Semiconductors via Quasi-van der Waals Contacts | |
Wang, Junjun; Wang, Feng; Wang, Zhenxing; Cheng, Ruiqing; Yin, Lei; Wen, Yao; Zhang, Yu; Li, Ningning; Zhan, Xueying; Xiao, Xiangheng | |
刊名 | ADVANCED SCIENCE |
2019 | |
卷号 | 6期号:11 |
关键词 | ambipolar 2D semiconductors Fermi level pinning effect Schottky barrier substrate influence van der Waals heterostructures |
DOI | 10.1002/advs.201801841 |
URL标识 | 查看原文 |
收录类别 | SCIE |
语种 | 英语 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4215818 |
专题 | 武汉大学 |
推荐引用方式 GB/T 7714 | Wang, Junjun,Wang, Feng,Wang, Zhenxing,et al. Controlling Injection Barriers for Ambipolar 2D Semiconductors via Quasi-van der Waals Contacts[J]. ADVANCED SCIENCE,2019,6(11). |
APA | Wang, Junjun.,Wang, Feng.,Wang, Zhenxing.,Cheng, Ruiqing.,Yin, Lei.,...&He, Jun.(2019).Controlling Injection Barriers for Ambipolar 2D Semiconductors via Quasi-van der Waals Contacts.ADVANCED SCIENCE,6(11). |
MLA | Wang, Junjun,et al."Controlling Injection Barriers for Ambipolar 2D Semiconductors via Quasi-van der Waals Contacts".ADVANCED SCIENCE 6.11(2019). |
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