SPUTTERING ANGULAR-DISTRIBUTIONS OF INDIVIDUAL ELEMENTS FOR LOW-ENERGY AR ION IRRADIATION OF PTCU ALLOY

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	SPUTTERING ANGULAR-DISTRIBUTIONS OF INDIVIDUAL ELEMENTS FOR LOW-ENERGY AR ION IRRADIATION OF PTCU ALLOY
	L. P. Zheng ; R. S. Li ; M. Y. Li ; W. Z. Shen ; J. Y. Lin ; Z. Y. Zou
刊名	Chinese Physics Letters
	1991
卷号	8 期号:1 页码:44-47
关键词	bombardment-induced segregation surface segregation implantation cu
ISSN号	0256-307X
中文摘要	The dynamic Monte Carlo program including a bombardment-induced Gibbsian segregation process was used to calculate angular distributions of individual elements from sputtered Cu0.5Pt0.5 alloy in the Ar ion energy range between 0.2 and 1.5keV. Calculated results show that for each investigated incident energy, the angular distribution of the Pt element is more forward-pointed than that of the Cu one; the reason may be that different percentage of sputtered atoms (37 approximately 45% of Pt and 12 approximately 19% of Cu) come from beneath the topmost layer.
原文出处	://WOS:A1991GF60300012
公开日期	2012-04-14
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/39515]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	L. P. Zheng,R. S. Li,M. Y. Li,et al. SPUTTERING ANGULAR-DISTRIBUTIONS OF INDIVIDUAL ELEMENTS FOR LOW-ENERGY AR ION IRRADIATION OF PTCU ALLOY[J]. Chinese Physics Letters,1991,8(1):44-47.
APA	L. P. Zheng,R. S. Li,M. Y. Li,W. Z. Shen,J. Y. Lin,&Z. Y. Zou.(1991).SPUTTERING ANGULAR-DISTRIBUTIONS OF INDIVIDUAL ELEMENTS FOR LOW-ENERGY AR ION IRRADIATION OF PTCU ALLOY.Chinese Physics Letters,8(1),44-47.
MLA	L. P. Zheng,et al."SPUTTERING ANGULAR-DISTRIBUTIONS OF INDIVIDUAL ELEMENTS FOR LOW-ENERGY AR ION IRRADIATION OF PTCU ALLOY".Chinese Physics Letters 8.1(1991):44-47.