Off-stoichiometry indexation of BiFeO3 thin film on silicon by Rutherford backscattering spectrometry | |
Wang, Ze-Song; Xiao, Ren-Zheng; Zou, Chang-Wei; Xie, Wei; Tian, Can-Xin; Xue, Shu-Wen; Liu, Gui-Ang; Devi, Neena; Fu, De-Jun | |
刊名 | CHINESE PHYSICS B
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2018 | |
卷号 | 27期号:4 |
关键词 | BiFeO3 thin films off-stoichiometry high temperature annealing backscattering spectrometry |
ISSN号 | 1674-1056 |
DOI | 10.1088/1674-1056/27/4/047901 |
URL标识 | 查看原文 |
收录类别 | SCIE |
语种 | 英语 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4153309 |
专题 | 武汉大学 |
推荐引用方式 GB/T 7714 | Wang, Ze-Song,Xiao, Ren-Zheng,Zou, Chang-Wei,et al. Off-stoichiometry indexation of BiFeO3 thin film on silicon by Rutherford backscattering spectrometry[J]. CHINESE PHYSICS B,2018,27(4). |
APA | Wang, Ze-Song.,Xiao, Ren-Zheng.,Zou, Chang-Wei.,Xie, Wei.,Tian, Can-Xin.,...&Fu, De-Jun.(2018).Off-stoichiometry indexation of BiFeO3 thin film on silicon by Rutherford backscattering spectrometry.CHINESE PHYSICS B,27(4). |
MLA | Wang, Ze-Song,et al."Off-stoichiometry indexation of BiFeO3 thin film on silicon by Rutherford backscattering spectrometry".CHINESE PHYSICS B 27.4(2018). |
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