Inhibitive self-assembled monolayers on metal surface

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	Inhibitive self-assembled monolayers on metal surface
	X. G. Yang ; S. H. Chen ; H. Y. Ma ; Z. L. Quan ; D. G. Li
刊名	Progress in Chemistry
	2003
卷号	15 期号:2 页码:123-128
关键词	self-assembled monolayers corrosion and protection of metal inhibitors schiff-base copper corrosion chemical modification alkanethiol monolayer protection films electrodes mechanism silver iron
ISSN号	1005-281X
中文摘要	Self-assembled monolayers (SAMs) play an important role in surface science, chemical engineering and materials science because of their relevance to both applied and fundamental studies. In this paper the application of self-assembled monolayers in the field of corrosion and protection of metals in recent years is summarized. Some representative self-assembly systems are introduced in detail. In addition, some common characterization technologies are evaluated, and the research results of our group are presented. The development of this technique in the future is also predicted.
原文出处	://WOS:000181960000006
公开日期	2012-04-14
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/36120]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	X. G. Yang,S. H. Chen,H. Y. Ma,et al. Inhibitive self-assembled monolayers on metal surface[J]. Progress in Chemistry,2003,15(2):123-128.
APA	X. G. Yang,S. H. Chen,H. Y. Ma,Z. L. Quan,&D. G. Li.(2003).Inhibitive self-assembled monolayers on metal surface.Progress in Chemistry,15(2),123-128.
MLA	X. G. Yang,et al."Inhibitive self-assembled monolayers on metal surface".Progress in Chemistry 15.2(2003):123-128.