Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering

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	Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering
	W. J. Zhang ; S. L. Zhu ; Y. Li ; F. H. Wang
刊名	Journal of Materials Science & Technology
	2004
卷号	20 期号:1 页码:31-34
关键词	TiO2 film photocatalytic activity DC magnetron sputtering film characteristic thin-films surface
ISSN号	1005-0302
中文摘要	TiO2 thin films were prepared by DC magnetron sputtering with the oxygen flow rate higher than the threshold. The film deposited for 5 h was of anatase phase with a preferred orientation along the <220> direction, but the films deposited for 2 and 3 h were amorphous. The transmittance and photocatalytic activity of the TiO2 films increased constantly with increasing film thickness. When the annealing temperature was lower than 700degreesC, only anatase grew in the TiO2 film. TiO2 phase changed from anatase to rutile when the annealing temperature was above 800degreesC. The photocatalytic activity decreased with increasing annealing temperature.
原文出处	://WOS:000220573700009
公开日期	2012-04-14
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/35726]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	W. J. Zhang,S. L. Zhu,Y. Li,et al. Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering[J]. Journal of Materials Science & Technology,2004,20(1):31-34.
APA	W. J. Zhang,S. L. Zhu,Y. Li,&F. H. Wang.(2004).Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering.Journal of Materials Science & Technology,20(1),31-34.
MLA	W. J. Zhang,et al."Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering".Journal of Materials Science & Technology 20.1(2004):31-34.