Copper doping in titanium oxide catalyst film prepared by dc reactive magnetron sputtering

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	Copper doping in titanium oxide catalyst film prepared by dc reactive magnetron sputtering
	W. J. Zhang ; Y. Li ; S. L. Zhu ; F. H. Wang
刊名	Catalysis Today
	2004
卷号	34090 页码:589-594
关键词	TiO2 film reactive magnetron sputtering copper doping photocatalytic activity tio2 photocatalysis degradation systems surface
ISSN号	0920-5861
中文摘要	Copper-doped titanium oxide films were prepared by dc magnetron sputtering using Ti and Cu mixed target. The XPS spectra showed that titanium was in the Ti4+ oxidation state and oxygen was in the form of O2- in TiO2 and CuO. Apparent high-intensity shake-up satellites of the main Cu 2p peaks indicated the existence of fully oxidized CuO in the Cu-doped TiO2 films. When the copper concentration was low, the Cu-doped TiO2 film had the similar anatase phase as pure TiO2. The samples became amorphous when copper concentration was more than 15.17 at.%. Copper oxides were in the amorphous state in all the films. In the sequence of decreasing copper concentration, the surface morphologies changed from flat to nano-crystalline with nano-sized pores. The absorption edges of the Cu-doped samples shifted to longer wavelength region and the optical transmittances of these films decreased abruptly with increasing copper concentration. The Cu-doped TiO2 films had different photocatalytic behavior in accordance with the amount of doped copper. The best copper doping concentration was 1.45 at.% in sample I, relating to the most effective photocatalytic activity. (C) 2004 Elsevier B.V. All rights reserved.
原文出处	://WOS:000223973200083
公开日期	2012-04-14
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/35724]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	W. J. Zhang,Y. Li,S. L. Zhu,et al. Copper doping in titanium oxide catalyst film prepared by dc reactive magnetron sputtering[J]. Catalysis Today,2004,34090:589-594.
APA	W. J. Zhang,Y. Li,S. L. Zhu,&F. H. Wang.(2004).Copper doping in titanium oxide catalyst film prepared by dc reactive magnetron sputtering.Catalysis Today,34090,589-594.
MLA	W. J. Zhang,et al."Copper doping in titanium oxide catalyst film prepared by dc reactive magnetron sputtering".Catalysis Today 34090(2004):589-594.