Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition

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	Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition
	M. J. Ha ; F. Fang ; J. M. Liu ; M. Wang
刊名	European Physical Journal D
	2005
卷号	34 期号:1-3 页码:195-198
关键词	layered nanostructures copper electrodeposition
ISSN号	1434-6060
中文摘要	We report a new Monte Carlo model to simulate the spontaneous oscillating growth in Cu(II)-acid electrochemical deposition system, and present the one-to-one correspondence between the oscillation of pH and the layered structure. Two mechanisms essential for the oscillation behavior, i.e. the adsorption and buffering, are incorporated into the deposition sequences. The simulation results are qualitatively in agreement with the experimental observations. Some system parameters essential for the oscillation generation are discussed. And through adjusting the adsorption ratio, the spatially columnar deposited structure is generated and the columnar alternative growth of copper and cuprous oxide phases is achieved.
原文出处	://WOS:000230562700042
公开日期	2012-04-14
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/34860]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	M. J. Ha,F. Fang,J. M. Liu,et al. Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition[J]. European Physical Journal D,2005,34(1-3):195-198.
APA	M. J. Ha,F. Fang,J. M. Liu,&M. Wang.(2005).Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition.European Physical Journal D,34(1-3),195-198.
MLA	M. J. Ha,et al."Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition".European Physical Journal D 34.1-3(2005):195-198.