EFFECT OF TECHNICAL PARAMETERS ON STRUCTURE AND DEPOSITION RATE OF CHROMIUM OXIDE FILMS PREPARED BY MAGNETRON SPUTTERING | |
Zhou Sihua; Guo Yanhua; Zhou Xiaodong; Li Jin; Tian Canxin | |
刊名 | JOURNAL OF THE BALKAN TRIBOLOGICAL ASSOCIATION |
2016 | |
卷号 | 22期号:1 |
关键词 | chromium oxide magnetron sputtering sputtering power target-substrate distance substrate bias deposition rate |
ISSN号 | 1310-4772 |
URL标识 | 查看原文 |
收录类别 | SCIE |
语种 | 英语 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4115371 |
专题 | 武汉大学 |
推荐引用方式 GB/T 7714 | Zhou Sihua,Guo Yanhua,Zhou Xiaodong,et al. EFFECT OF TECHNICAL PARAMETERS ON STRUCTURE AND DEPOSITION RATE OF CHROMIUM OXIDE FILMS PREPARED BY MAGNETRON SPUTTERING[J]. JOURNAL OF THE BALKAN TRIBOLOGICAL ASSOCIATION,2016,22(1). |
APA | Zhou Sihua,Guo Yanhua,Zhou Xiaodong,Li Jin,&Tian Canxin.(2016).EFFECT OF TECHNICAL PARAMETERS ON STRUCTURE AND DEPOSITION RATE OF CHROMIUM OXIDE FILMS PREPARED BY MAGNETRON SPUTTERING.JOURNAL OF THE BALKAN TRIBOLOGICAL ASSOCIATION,22(1). |
MLA | Zhou Sihua,et al."EFFECT OF TECHNICAL PARAMETERS ON STRUCTURE AND DEPOSITION RATE OF CHROMIUM OXIDE FILMS PREPARED BY MAGNETRON SPUTTERING".JOURNAL OF THE BALKAN TRIBOLOGICAL ASSOCIATION 22.1(2016). |
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