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EFFECT OF TECHNICAL PARAMETERS ON STRUCTURE AND DEPOSITION RATE OF CHROMIUM OXIDE FILMS PREPARED BY MAGNETRON SPUTTERING
Zhou Sihua; Guo Yanhua; Zhou Xiaodong; Li Jin; Tian Canxin
刊名JOURNAL OF THE BALKAN TRIBOLOGICAL ASSOCIATION
2016
卷号22期号:1
关键词chromium oxide magnetron sputtering sputtering power target-substrate distance substrate bias deposition rate
ISSN号1310-4772
URL标识查看原文
收录类别SCIE
语种英语
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/4115371
专题武汉大学
推荐引用方式
GB/T 7714
Zhou Sihua,Guo Yanhua,Zhou Xiaodong,et al. EFFECT OF TECHNICAL PARAMETERS ON STRUCTURE AND DEPOSITION RATE OF CHROMIUM OXIDE FILMS PREPARED BY MAGNETRON SPUTTERING[J]. JOURNAL OF THE BALKAN TRIBOLOGICAL ASSOCIATION,2016,22(1).
APA Zhou Sihua,Guo Yanhua,Zhou Xiaodong,Li Jin,&Tian Canxin.(2016).EFFECT OF TECHNICAL PARAMETERS ON STRUCTURE AND DEPOSITION RATE OF CHROMIUM OXIDE FILMS PREPARED BY MAGNETRON SPUTTERING.JOURNAL OF THE BALKAN TRIBOLOGICAL ASSOCIATION,22(1).
MLA Zhou Sihua,et al."EFFECT OF TECHNICAL PARAMETERS ON STRUCTURE AND DEPOSITION RATE OF CHROMIUM OXIDE FILMS PREPARED BY MAGNETRON SPUTTERING".JOURNAL OF THE BALKAN TRIBOLOGICAL ASSOCIATION 22.1(2016).
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