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Mechanisms and Kinetics of the Hydrothermal Oxidation of Bulk Titanium Silicon Carbide
H. B. Zhang ; V. Presser ; C. Berthold ; K. G. Nickel ; X. Wang ; C. Raisch ; T. Chasse ; L. F. He ; Y. C. Zhou
刊名Journal of the American Ceramic Society
2010
卷号93期号:4页码:1148-1155
关键词amorphous-carbon films ti3si0.9al0.1c2 solid-solution temperature oxidation m(n+1)ax(n) phases ternary carbides ti3sic2 powders laser raman thin-film behavior corrosion
ISSN号0002-7820
中文摘要Hydrothermal oxidation of bulk Ti(3)SiC(2) in continuous water flow was studied at 500 degrees-700 degrees C under a hydrostatic pressure of 35 MPa. The oxidation was weak at 500 degrees-600 degrees C and accelerated at 700 degrees C due to the formation of cracks in oxides. The kinetics obeyed a linear time-law. Due to the high solubility of silica in hydrothermal water, the resulting oxide layers only consisted of titanium oxides and carbon. Besides general oxidation, two special modes are very likely present in current experiments: (1) preferential hydrothermal oxidation of lattice planes perpendicular to the c-axis inducing cleavage of grains and (2) uneven hydrothermal oxidation related to the occurrence of TiC and SiC impurity inclusions. Nonetheless the resistance against hydrothermal oxidation is remarkably high up to 700 degrees C.
原文出处://WOS:000276246700044
公开日期2012-04-13
内容类型期刊论文
源URL[http://210.72.142.130/handle/321006/31691]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
H. B. Zhang,V. Presser,C. Berthold,et al. Mechanisms and Kinetics of the Hydrothermal Oxidation of Bulk Titanium Silicon Carbide[J]. Journal of the American Ceramic Society,2010,93(4):1148-1155.
APA H. B. Zhang.,V. Presser.,C. Berthold.,K. G. Nickel.,X. Wang.,...&Y. C. Zhou.(2010).Mechanisms and Kinetics of the Hydrothermal Oxidation of Bulk Titanium Silicon Carbide.Journal of the American Ceramic Society,93(4),1148-1155.
MLA H. B. Zhang,et al."Mechanisms and Kinetics of the Hydrothermal Oxidation of Bulk Titanium Silicon Carbide".Journal of the American Ceramic Society 93.4(2010):1148-1155.
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