A novel capacitive accelerometer with an eight-beam-mass structure by self-stop anisotropic etching of (100) silicon
Xiao, F ; Che, LF ; Xiong, B ; Wang, YL ; Zhou, XF ; Li, YF ; Lin, YL
刊名JOURNAL OF MICROMECHANICS AND MICROENGINEERING
2008
卷号18期号:6 Pages页码:075005
公开日期2012-05-12
内容类型期刊论文
源URL[http://ir.sim.ac.cn/handle/331004/108733]  
专题上海微系统与信息技术研究所_传感技术联合国家重点实验室_期刊论文
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GB/T 7714
Xiao, F,Che, LF,Xiong, B,et al. A novel capacitive accelerometer with an eight-beam-mass structure by self-stop anisotropic etching of (100) silicon[J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING,2008,18(6 Pages):075005.
APA Xiao, F.,Che, LF.,Xiong, B.,Wang, YL.,Zhou, XF.,...&Lin, YL.(2008).A novel capacitive accelerometer with an eight-beam-mass structure by self-stop anisotropic etching of (100) silicon.JOURNAL OF MICROMECHANICS AND MICROENGINEERING,18(6 Pages),075005.
MLA Xiao, F,et al."A novel capacitive accelerometer with an eight-beam-mass structure by self-stop anisotropic etching of (100) silicon".JOURNAL OF MICROMECHANICS AND MICROENGINEERING 18.6 Pages(2008):075005.
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