Characterization of NbAlO dielectric film deposited on InP

	Characterization of NbAlO dielectric film deposited on InP
	He,DW ; Cheng,XH ; Xu,DW ; Wang,ZJ ; Yu,YH ; Sun,QQ ; Zhang,DW
刊名	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
	2011
卷号	29 期号:1 页码:01A803
关键词	A V S AMER INST PHYSICS
ISSN号	1071-1023
学科主题	Engineering ; Electrical & Electronic; Nanoscience & Nanotechnology; Physics ; Applied
公开日期	2012-04-10
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/106772]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	He,DW,Cheng,XH,Xu,DW,et al. Characterization of NbAlO dielectric film deposited on InP[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2011,29(1):01A803.
APA	He,DW.,Cheng,XH.,Xu,DW.,Wang,ZJ.,Yu,YH.,...&Zhang,DW.(2011).Characterization of NbAlO dielectric film deposited on InP.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,29(1),01A803.
MLA	He,DW,et al."Characterization of NbAlO dielectric film deposited on InP".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 29.1(2011):01A803.