Impact of within-wafer process variability on radiation response

	Impact of within-wafer process variability on radiation response
	Hu,ZY ; Liu,ZL ; Shao,H ; Zhang,ZX ; Ning,BX ; Chen,M ; Bi,DW ; Zou,SC
刊名	MICROELECTRONICS JOURNAL
	2011
卷号	42 期号:6 页码:883-888
关键词	ELSEVIER SCI LTD
ISSN号	0026-2692
学科主题	Engineering ; Electrical & Electronic; Nanoscience & Nanotechnology
公开日期	2012-04-10
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/106719]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	Hu,ZY,Liu,ZL,Shao,H,et al. Impact of within-wafer process variability on radiation response[J]. MICROELECTRONICS JOURNAL,2011,42(6):883-888.
APA	Hu,ZY.,Liu,ZL.,Shao,H.,Zhang,ZX.,Ning,BX.,...&Zou,SC.(2011).Impact of within-wafer process variability on radiation response.MICROELECTRONICS JOURNAL,42(6),883-888.
MLA	Hu,ZY,et al."Impact of within-wafer process variability on radiation response".MICROELECTRONICS JOURNAL 42.6(2011):883-888.