Rotating compensator sampling for spectroscopic imaging ellipsometry

	Rotating compensator sampling for spectroscopic imaging ellipsometry
	Meng YH(孟永宏); Jin G(靳刚)
	2011
会议名称	5th International Conference on Spectroscopic Ellipsometry
会议日期	MAY 23-29, 2010
通讯作者邮箱	yhong@imech.ac.cn; gajin@imech.ac.cn
会议地点	Albany, NY
关键词	Rotating compensator Spectroscopic imaging ellipsometry Spectroscopic ellipsometry Imaging ellipsometry Ellipsometry Nanofilm pattern
卷号	519
期号	9
页码	2742-2745
通讯作者	Jin, G (reprint author), Chinese Acad Sci, Inst Mech, 15 Bei Si Huan W Rd, Beijing 100190, Peoples R China
中文摘要	In this work, a rotating compensator sampling for spectroscopic imaging ellipsometry (SIE) is presented and demonstrated by characterization of a SiO(2) nanofilm pattern on Si substrate. Experiment results within spectrum of 400-700 nm show that the rotating compensator sampling is valid for SIE to obtain the ellipsometric angle distributions psi (x, y, lambda) and Delta (x, y, lambda) over the thin film pattern, the sampling times of psi (x, y) and Delta (x, y) with 576 x 768 pixels under each wavelength is less than 8 s, the precision of fitting thickness of SiO(2) is about 0.2 nm and the lateral resolution is 60.9 mu m x 24.6 mu m in the parallel and perpendicular direction with respect to the incident plane. (C) 2010 Elsevier B.V. All rights reserved.
收录类别	CPCI（ISTP）
产权排序	Chinese Acad Sci, Inst Mech, Beijing 100190, Peoples R China; Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
会议主办者	Univ Albany, Coll Nanoscale & Engn
会议网址	http://dx.doi.org/10.1016/j.tsf.2010.12.131
会议录	THIN SOLID FILMS
会议录出版者	ELSEVIER SCIENCE SA
会议录出版地	PO BOX 564, 1001 LAUSANNE, SWITZERLAND
学科主题	Materials Science, Multidisciplinary; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter
语种	英语
ISSN号	0040-6090
内容类型	会议论文
源URL	[http://dspace.imech.ac.cn/handle/311007/45326]
专题	力学研究所_国家微重力实验室
推荐引用方式 GB/T 7714	Meng YH,Jin G. Rotating compensator sampling for spectroscopic imaging ellipsometry[C]. 见:5th International Conference on Spectroscopic Ellipsometry. Albany, NY. MAY 23-29, 2010.http://dx.doi.org/10.1016/j.tsf.2010.12.131.