Spectroscopic ellipsometry chraracterization of the interfacial roughness in simox wafers

	Spectroscopic ellipsometry chraracterization of the interfacial roughness in simox wafers
	Li,WJ ; Song,ZR ; Tao,K ; Cheng,XH ; Yang,WW ; Yu,YH ; Wang,X ; Zou,SC ; Shen,DS
刊名	THIN SOLID FILMS
	2004
卷号	459 期号:1-2 页码:63-66
关键词	ATOMIC-FORCE MICROSCOPY SURFACES
ISSN号	0040-6090
通讯作者	Yu, YH, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Ion Beam Lab, Shanghai 200050, Peoples R China
学科主题	Materials Science ; Multidisciplinary; Materials Science ; Coatings & Films; Physics ; Applied; Physics ; Condensed Matter
收录类别	SCI
公开日期	2012-03-24
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/95378]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	Li,WJ,Song,ZR,Tao,K,et al. Spectroscopic ellipsometry chraracterization of the interfacial roughness in simox wafers[J]. THIN SOLID FILMS,2004,459(1-2):63-66.
APA	Li,WJ.,Song,ZR.,Tao,K.,Cheng,XH.,Yang,WW.,...&Shen,DS.(2004).Spectroscopic ellipsometry chraracterization of the interfacial roughness in simox wafers.THIN SOLID FILMS,459(1-2),63-66.
MLA	Li,WJ,et al."Spectroscopic ellipsometry chraracterization of the interfacial roughness in simox wafers".THIN SOLID FILMS 459.1-2(2004):63-66.