Direct measurement of surface roughness of corner mirrors after vacuum annealing
Wang, Y ; Gao, F ; Jiang, J ; Cao, G ; Zhang, F
刊名IEE PROCEEDINGS-OPTOELECTRONICS
2005
卷号152期号:6页码:353-355
关键词SILICON-ON-INSULATOR SIDEWALL ROUGHNESS TURNING MIRRORS WAVE-GUIDES TECHNOLOGY
ISSN号1350-2433
通讯作者Wang, Y, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Ion Beam Lab, 865 Changning Rd, Shanghai 200050, Peoples R China
学科主题Engineering, Electrical & Electronic; Optics; Telecommunications
收录类别SCI
语种英语
公开日期2012-03-24
内容类型期刊论文
源URL[http://ir.sim.ac.cn/handle/331004/95330]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Wang, Y,Gao, F,Jiang, J,et al. Direct measurement of surface roughness of corner mirrors after vacuum annealing[J]. IEE PROCEEDINGS-OPTOELECTRONICS,2005,152(6):353-355.
APA Wang, Y,Gao, F,Jiang, J,Cao, G,&Zhang, F.(2005).Direct measurement of surface roughness of corner mirrors after vacuum annealing.IEE PROCEEDINGS-OPTOELECTRONICS,152(6),353-355.
MLA Wang, Y,et al."Direct measurement of surface roughness of corner mirrors after vacuum annealing".IEE PROCEEDINGS-OPTOELECTRONICS 152.6(2005):353-355.
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace