Direct measurement of surface roughness of corner mirrors after vacuum annealing | |
Wang, Y ; Gao, F ; Jiang, J ; Cao, G ; Zhang, F | |
刊名 | IEE PROCEEDINGS-OPTOELECTRONICS
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2005 | |
卷号 | 152期号:6页码:353-355 |
关键词 | SILICON-ON-INSULATOR SIDEWALL ROUGHNESS TURNING MIRRORS WAVE-GUIDES TECHNOLOGY |
ISSN号 | 1350-2433 |
通讯作者 | Wang, Y, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Ion Beam Lab, 865 Changning Rd, Shanghai 200050, Peoples R China |
学科主题 | Engineering, Electrical & Electronic; Optics; Telecommunications |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2012-03-24 |
内容类型 | 期刊论文 |
源URL | [http://ir.sim.ac.cn/handle/331004/95330] ![]() |
专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
推荐引用方式 GB/T 7714 | Wang, Y,Gao, F,Jiang, J,et al. Direct measurement of surface roughness of corner mirrors after vacuum annealing[J]. IEE PROCEEDINGS-OPTOELECTRONICS,2005,152(6):353-355. |
APA | Wang, Y,Gao, F,Jiang, J,Cao, G,&Zhang, F.(2005).Direct measurement of surface roughness of corner mirrors after vacuum annealing.IEE PROCEEDINGS-OPTOELECTRONICS,152(6),353-355. |
MLA | Wang, Y,et al."Direct measurement of surface roughness of corner mirrors after vacuum annealing".IEE PROCEEDINGS-OPTOELECTRONICS 152.6(2005):353-355. |
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