Field emission from hafnium oxynitride films prepared by ion beam-assisted deposition | |
Wang,YJ ; Zhang,JH ; Zhang,FM ; Zhang,F ; Zou,SC | |
刊名 | APPLIED SURFACE SCIENCE
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2005 | |
卷号 | 242期号:3-4页码:407-411 |
关键词 | HF-N FILMS NITRIDE FILMS CARBON NANOTUBES |
ISSN号 | 0169-4332 |
通讯作者 | Wang, YJ, Chinese Acad Sci, Ion Beam Lab, Shanghai Inst Microsyst & Informat Technol, 865 Changning Rd, Shanghai 200050, Peoples R China |
学科主题 | Chemistry ; Physical; Materials Science ; Coatings & Films; Physics ; Applied; Physics ; Condensed Matter |
收录类别 | SCI |
公开日期 | 2012-03-24 |
内容类型 | 期刊论文 |
源URL | [http://ir.sim.ac.cn/handle/331004/95307] ![]() |
专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
推荐引用方式 GB/T 7714 | Wang,YJ,Zhang,JH,Zhang,FM,et al. Field emission from hafnium oxynitride films prepared by ion beam-assisted deposition[J]. APPLIED SURFACE SCIENCE,2005,242(3-4):407-411. |
APA | Wang,YJ,Zhang,JH,Zhang,FM,Zhang,F,&Zou,SC.(2005).Field emission from hafnium oxynitride films prepared by ion beam-assisted deposition.APPLIED SURFACE SCIENCE,242(3-4),407-411. |
MLA | Wang,YJ,et al."Field emission from hafnium oxynitride films prepared by ion beam-assisted deposition".APPLIED SURFACE SCIENCE 242.3-4(2005):407-411. |
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