Field emission from hafnium oxynitride films prepared by ion beam-assisted deposition

	Field emission from hafnium oxynitride films prepared by ion beam-assisted deposition
	Wang,YJ ; Zhang,JH ; Zhang,FM ; Zhang,F ; Zou,SC
刊名	APPLIED SURFACE SCIENCE
	2005
卷号	242 期号:3-4 页码:407-411
关键词	HF-N FILMS NITRIDE FILMS CARBON NANOTUBES
ISSN号	0169-4332
通讯作者	Wang, YJ, Chinese Acad Sci, Ion Beam Lab, Shanghai Inst Microsyst & Informat Technol, 865 Changning Rd, Shanghai 200050, Peoples R China
学科主题	Chemistry ; Physical; Materials Science ; Coatings & Films; Physics ; Applied; Physics ; Condensed Matter
收录类别	SCI
公开日期	2012-03-24
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/95307]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	Wang,YJ,Zhang,JH,Zhang,FM,et al. Field emission from hafnium oxynitride films prepared by ion beam-assisted deposition[J]. APPLIED SURFACE SCIENCE,2005,242(3-4):407-411.
APA	Wang,YJ,Zhang,JH,Zhang,FM,Zhang,F,&Zou,SC.(2005).Field emission from hafnium oxynitride films prepared by ion beam-assisted deposition.APPLIED SURFACE SCIENCE,242(3-4),407-411.
MLA	Wang,YJ,et al."Field emission from hafnium oxynitride films prepared by ion beam-assisted deposition".APPLIED SURFACE SCIENCE 242.3-4(2005):407-411.