Comparison of metal-organic chemical vapour deposition TiN thin films with different process cycles | |
Yi, LW ; Zhang, WJ ; Wu, J ; Mao, DL | |
刊名 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY
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2006 | |
卷号 | 21期号:3页码:250-253 |
关键词 | TITANIUM NITRIDE PLASMA TREATMENT |
ISSN号 | 0268-1242 |
通讯作者 | Yi, LW, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China |
学科主题 | Engineering, Electrical & Electronic; Materials Science, Multidisciplinary; Physics, Condensed Matter |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2012-03-24 |
内容类型 | 期刊论文 |
源URL | [http://ir.sim.ac.cn/handle/331004/95182] ![]() |
专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
推荐引用方式 GB/T 7714 | Yi, LW,Zhang, WJ,Wu, J,et al. Comparison of metal-organic chemical vapour deposition TiN thin films with different process cycles[J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY,2006,21(3):250-253. |
APA | Yi, LW,Zhang, WJ,Wu, J,&Mao, DL.(2006).Comparison of metal-organic chemical vapour deposition TiN thin films with different process cycles.SEMICONDUCTOR SCIENCE AND TECHNOLOGY,21(3),250-253. |
MLA | Yi, LW,et al."Comparison of metal-organic chemical vapour deposition TiN thin films with different process cycles".SEMICONDUCTOR SCIENCE AND TECHNOLOGY 21.3(2006):250-253. |
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