Layout optimization for thick-film resist overlay metrology - art. no. 682726

	Layout optimization for thick-film resist overlay metrology - art. no. 682726
	Zhu, L ; Li, J ; Zhou, B ; Gu, YL ; Yang, S
刊名	QUANTUM OPTICS, OPTICAL DATA STORAGE, AND ADVANCED MICROLITHOGRAPHY
	2008
卷号	6827 页码:82726-82726
ISSN号	0277-786X
通讯作者	Zhu, L, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
学科主题	Optics
收录类别	SCI
原文出处	http://spiedigitallibrary.org/proceedings/resource/2/psisdg/6827/1/682726_1?isAuthorized=no
语种	英语
公开日期	2012-03-24
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/94967]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	Zhu, L,Li, J,Zhou, B,et al. Layout optimization for thick-film resist overlay metrology - art. no. 682726[J]. QUANTUM OPTICS, OPTICAL DATA STORAGE, AND ADVANCED MICROLITHOGRAPHY,2008,6827:82726-82726.
APA	Zhu, L,Li, J,Zhou, B,Gu, YL,&Yang, S.(2008).Layout optimization for thick-film resist overlay metrology - art. no. 682726.QUANTUM OPTICS, OPTICAL DATA STORAGE, AND ADVANCED MICROLITHOGRAPHY,6827,82726-82726.
MLA	Zhu, L,et al."Layout optimization for thick-film resist overlay metrology - art. no. 682726".QUANTUM OPTICS, OPTICAL DATA STORAGE, AND ADVANCED MICROLITHOGRAPHY 6827(2008):82726-82726.