Overall energy model for preferred growth of TiN films during filtered arc deposition

	Overall energy model for preferred growth of TiN films during filtered arc deposition
	Zhao, JP ; Wang, X ; Chen, ZY ; Yang, SQ ; Shi, TS ; Liu, XH
刊名	JOURNAL OF PHYSICS D-APPLIED PHYSICS
	1997
卷号	30 期号:1 页码:5-12
关键词	COATINGS ORIENTATION EVOLUTION
ISSN号	0022-3727
通讯作者	Zhao, JP, CHINESE ACAD SCI, SHANGHAI INST MET, ION BEAM LAB, SHANGHAI 200050, PEOPLES R CHINA
学科主题	Physics, Applied
收录类别	SCI
语种	英语
公开日期	2012-03-25
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/98827]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文（1999年以前)
推荐引用方式 GB/T 7714	Zhao, JP,Wang, X,Chen, ZY,et al. Overall energy model for preferred growth of TiN films during filtered arc deposition[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,1997,30(1):5-12.
APA	Zhao, JP,Wang, X,Chen, ZY,Yang, SQ,Shi, TS,&Liu, XH.(1997).Overall energy model for preferred growth of TiN films during filtered arc deposition.JOURNAL OF PHYSICS D-APPLIED PHYSICS,30(1),5-12.
MLA	Zhao, JP,et al."Overall energy model for preferred growth of TiN films during filtered arc deposition".JOURNAL OF PHYSICS D-APPLIED PHYSICS 30.1(1997):5-12.