GROWTH OF CUBIC BORON-NITRIDE THIN-FILMS BY A FIELD-IONIZATION SOURCE-ASSISTED PULSED-LASER DEPOSITION

	GROWTH OF CUBIC BORON-NITRIDE THIN-FILMS BY A FIELD-IONIZATION SOURCE-ASSISTED PULSED-LASER DEPOSITION
	XIN,HP ; CHEN,YQ ; SHI,XH ; XU,HP ; LIN,CL ; Zou,SC
刊名	THIN SOLID FILMS
	1995
卷号	266 期号:2 页码:173-175
关键词	DIAMOND SILICON
ISSN号	0040-6090
通讯作者	XIN, HP, CHINESE ACAD SCI,SHANGHAI INST MET,NATL LAB FUNCT MAT INFORMAT,SHANGHAI 200050,PEOPLES R CHINA
学科主题	Materials Science ; Multidisciplinary; Materials Science ; Coatings & Films; Physics ; Applied; Physics ; Condensed Matter
收录类别	SCI
公开日期	2012-03-25
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/98605]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文（1999年以前)
推荐引用方式 GB/T 7714	XIN,HP,CHEN,YQ,SHI,XH,et al. GROWTH OF CUBIC BORON-NITRIDE THIN-FILMS BY A FIELD-IONIZATION SOURCE-ASSISTED PULSED-LASER DEPOSITION[J]. THIN SOLID FILMS,1995,266(2):173-175.
APA	XIN,HP,CHEN,YQ,SHI,XH,XU,HP,LIN,CL,&Zou,SC.(1995).GROWTH OF CUBIC BORON-NITRIDE THIN-FILMS BY A FIELD-IONIZATION SOURCE-ASSISTED PULSED-LASER DEPOSITION.THIN SOLID FILMS,266(2),173-175.
MLA	XIN,HP,et al."GROWTH OF CUBIC BORON-NITRIDE THIN-FILMS BY A FIELD-IONIZATION SOURCE-ASSISTED PULSED-LASER DEPOSITION".THIN SOLID FILMS 266.2(1995):173-175.