ELECTRICAL CHARACTERIZATION OF THIN-FILM SIMOX STRUCTURES
ZHU, WH ; LIN, CL ; SHI, ZY ; Zou, SC(邹世昌) ; HEMMENT, PLF ; NEJIM, A
刊名NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
1993
卷号74期号:1-2页码:218-221
关键词SILICON LAYERS
ISSN号0168-583X
通讯作者ZHU, WH, CHINESE ACAD SCI,SHANGHAI INST MET,ION BEAM LAB,SHANGHAI 200050,PEOPLES R CHINA
学科主题Instruments & Instrumentation; Nuclear Science & Technology; Physics, Atomic, Molecular & Chemical; Physics, Nuclear
收录类别SCI
原文出处http://www.sciencedirect.com/science/article/pii/0168583X93950479
语种英语
公开日期2012-03-25
内容类型期刊论文
源URL[http://ir.sim.ac.cn/handle/331004/98485]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文(1999年以前)
推荐引用方式
GB/T 7714
ZHU, WH,LIN, CL,SHI, ZY,et al. ELECTRICAL CHARACTERIZATION OF THIN-FILM SIMOX STRUCTURES[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,1993,74(1-2):218-221.
APA ZHU, WH,LIN, CL,SHI, ZY,Zou, SC,HEMMENT, PLF,&NEJIM, A.(1993).ELECTRICAL CHARACTERIZATION OF THIN-FILM SIMOX STRUCTURES.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,74(1-2),218-221.
MLA ZHU, WH,et al."ELECTRICAL CHARACTERIZATION OF THIN-FILM SIMOX STRUCTURES".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 74.1-2(1993):218-221.
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