HIGH-TEMPERATURE OXIDATION RESISTANCE OF TIAL IMPROVED BY IBED SI3N4 COATING

	HIGH-TEMPERATURE OXIDATION RESISTANCE OF TIAL IMPROVED BY IBED SI3N4 COATING
	TANIGUCHI, S ; SHIBATA, T ; YAMADA, T ; LIU, XH ; Zou, SC(邹世昌）
刊名	ISIJ INTERNATIONAL
	1993
卷号	33 期号:8 页码:869-876
关键词	BEAM-ENHANCED DEPOSITION SILICON-NITRIDE FILMS INTERMETALLIC COMPOUND DEFORMATION BEHAVIOR OXYGEN
ISSN号	0915-1559
通讯作者	TANIGUCHI, S, OSAKA UNIV,FAC ENGN,DEPT MAT SCI & PROC,TOYONAKA,OSAKA 560,JAPAN
学科主题	Metallurgy & Metallurgical Engineering
收录类别	SCI
语种	英语
公开日期	2012-03-25
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/98469]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文（1999年以前)
推荐引用方式 GB/T 7714	TANIGUCHI, S,SHIBATA, T,YAMADA, T,et al. HIGH-TEMPERATURE OXIDATION RESISTANCE OF TIAL IMPROVED BY IBED SI3N4 COATING[J]. ISIJ INTERNATIONAL,1993,33(8):869-876.
APA	TANIGUCHI, S,SHIBATA, T,YAMADA, T,LIU, XH,&Zou, SC.(1993).HIGH-TEMPERATURE OXIDATION RESISTANCE OF TIAL IMPROVED BY IBED SI3N4 COATING.ISIJ INTERNATIONAL,33(8),869-876.
MLA	TANIGUCHI, S,et al."HIGH-TEMPERATURE OXIDATION RESISTANCE OF TIAL IMPROVED BY IBED SI3N4 COATING".ISIJ INTERNATIONAL 33.8(1993):869-876.