Millimeter-scale self-collimation in planar photonic crystals fabricated by CMOS technology

	Millimeter-scale self-collimation in planar photonic crystals fabricated by CMOS technology
	Yang,ZF ; Wu,AM ; Fang,N ; Lin,XL ; Jiang,XY ; Zou,SC ; Wang,X
刊名	OPTICS COMMUNICATIONS
	2010
卷号	283 期号:4 页码:604-607
关键词	LITHOGRAPHY
ISSN号	0030-4018
通讯作者	Yang, ZF, Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
学科主题	Optics
收录类别	SCI
公开日期	2012-03-24
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/94641]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	Yang,ZF,Wu,AM,Fang,N,et al. Millimeter-scale self-collimation in planar photonic crystals fabricated by CMOS technology[J]. OPTICS COMMUNICATIONS,2010,283(4):604-607.
APA	Yang,ZF.,Wu,AM.,Fang,N.,Lin,XL.,Jiang,XY.,...&Wang,X.(2010).Millimeter-scale self-collimation in planar photonic crystals fabricated by CMOS technology.OPTICS COMMUNICATIONS,283(4),604-607.
MLA	Yang,ZF,et al."Millimeter-scale self-collimation in planar photonic crystals fabricated by CMOS technology".OPTICS COMMUNICATIONS 283.4(2010):604-607.