Improving electrical conductivity and wear resistance of hafnium nitride films via tantalum incorporation | |
Zheng, Weitao; Wu, Lulu; Wen, Mao; Zhang, Sam; Gu, Zhiqing; Zhao, Yue; Gao, Jing; Hu, Chaoquan | |
刊名 | CERAMICS INTERNATIONAL |
2017 | |
卷号 | 43期号:11 |
关键词 | Transition metal nitride films Structure Electrical conductivity Wear property |
ISSN号 | 0272-8842 |
URL标识 | 查看原文 |
语种 | 英语 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/3514425 |
专题 | 吉林大学白求恩第三医院 |
推荐引用方式 GB/T 7714 | Zheng, Weitao,Wu, Lulu,Wen, Mao,et al. Improving electrical conductivity and wear resistance of hafnium nitride films via tantalum incorporation[J]. CERAMICS INTERNATIONAL,2017,43(11). |
APA | Zheng, Weitao.,Wu, Lulu.,Wen, Mao.,Zhang, Sam.,Gu, Zhiqing.,...&Hu, Chaoquan.(2017).Improving electrical conductivity and wear resistance of hafnium nitride films via tantalum incorporation.CERAMICS INTERNATIONAL,43(11). |
MLA | Zheng, Weitao,et al."Improving electrical conductivity and wear resistance of hafnium nitride films via tantalum incorporation".CERAMICS INTERNATIONAL 43.11(2017). |
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