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	A novel functional group difference-based selective etching strategy for the synthesis of hollow organic silica nanospheres
	Zeng, Fanlong; Chen, Lianxi*; Li, Jie; Ye, Xinshan; Yu, Huogen; Liu, Zhenhui
刊名	RSC Advances
	2016
卷号	6期号:32页码:26914-26920
ISSN号	2046-2069
DOI	10.1039/c5ra25161c
URL标识	查看原文
WOS记录号	WOS:000372253700052;EI:20161202136725
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3383885
专题	武汉理工大学
作者单位	1.[Chen, Lianxi 2.Yu, Huogen 3.Liu, Zhenhui 4.Li, Jie 5.Zeng, Fanlong] Wuhan Univ Technol, Sch Chem Chem Engn & Life Sci, Wuhan 430070, Peoples R China.
推荐引用方式 GB/T 7714	Zeng, Fanlong,Chen, Lianxi*,Li, Jie,et al. A novel functional group difference-based selective etching strategy for the synthesis of hollow organic silica nanospheres[J]. RSC Advances,2016,6(32):26914-26920.
APA	Zeng, Fanlong,Chen, Lianxi*,Li, Jie,Ye, Xinshan,Yu, Huogen,&Liu, Zhenhui.(2016).A novel functional group difference-based selective etching strategy for the synthesis of hollow organic silica nanospheres.RSC Advances,6(32),26914-26920.
MLA	Zeng, Fanlong,et al."A novel functional group difference-based selective etching strategy for the synthesis of hollow organic silica nanospheres".RSC Advances 6.32(2016):26914-26920.

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