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Microstructuring of carbon/tin quantum dots via a novel photolithography and pyrolysis-reduction process
Hong Xufeng; He Liang; Ma Xinyu; Yang Wei; Chen Yiming; Zhang Lei; Yan Haowu; Li Zhaohuai; Mai Liqiang
刊名Nano Research
2017
卷号10期号:11页码:3743-3753
关键词carbon micro-supercapacitors quantum dots photolithography microdevices
ISSN号1998-0124
DOI10.1007/s12274-017-1587-2
URL标识查看原文
WOS记录号WOS:000413100400013
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/3378642
专题武汉理工大学
作者单位1.[Mai Liqiang
2.Yan Haowu
3.Hong Xufeng
4.Chen Yiming
5.He Liang
6.Mai, LQ
7.Zhang Lei
8.Li Zhaohuai
9.He, Liang
10.Ma Xinyu
推荐引用方式
GB/T 7714
Hong Xufeng,He Liang,Ma Xinyu,et al. Microstructuring of carbon/tin quantum dots via a novel photolithography and pyrolysis-reduction process[J]. Nano Research,2017,10(11):3743-3753.
APA Hong Xufeng.,He Liang.,Ma Xinyu.,Yang Wei.,Chen Yiming.,...&Mai Liqiang.(2017).Microstructuring of carbon/tin quantum dots via a novel photolithography and pyrolysis-reduction process.Nano Research,10(11),3743-3753.
MLA Hong Xufeng,et al."Microstructuring of carbon/tin quantum dots via a novel photolithography and pyrolysis-reduction process".Nano Research 10.11(2017):3743-3753.
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