Microstructuring of carbon/tin quantum dots via a novel photolithography and pyrolysis-reduction process | |
Hong Xufeng; He Liang; Ma Xinyu; Yang Wei; Chen Yiming; Zhang Lei; Yan Haowu; Li Zhaohuai; Mai Liqiang | |
刊名 | Nano Research |
2017 | |
卷号 | 10期号:11页码:3743-3753 |
关键词 | carbon micro-supercapacitors quantum dots photolithography microdevices |
ISSN号 | 1998-0124 |
DOI | 10.1007/s12274-017-1587-2 |
URL标识 | 查看原文 |
WOS记录号 | WOS:000413100400013 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/3378642 |
专题 | 武汉理工大学 |
作者单位 | 1.[Mai Liqiang 2.Yan Haowu 3.Hong Xufeng 4.Chen Yiming 5.He Liang 6.Mai, LQ 7.Zhang Lei 8.Li Zhaohuai 9.He, Liang 10.Ma Xinyu |
推荐引用方式 GB/T 7714 | Hong Xufeng,He Liang,Ma Xinyu,et al. Microstructuring of carbon/tin quantum dots via a novel photolithography and pyrolysis-reduction process[J]. Nano Research,2017,10(11):3743-3753. |
APA | Hong Xufeng.,He Liang.,Ma Xinyu.,Yang Wei.,Chen Yiming.,...&Mai Liqiang.(2017).Microstructuring of carbon/tin quantum dots via a novel photolithography and pyrolysis-reduction process.Nano Research,10(11),3743-3753. |
MLA | Hong Xufeng,et al."Microstructuring of carbon/tin quantum dots via a novel photolithography and pyrolysis-reduction process".Nano Research 10.11(2017):3743-3753. |
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