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	Effect of oxygen plasma treatment on air exposed MoOx thin film
	Liu, Xiaoliang; Yi, Shijuan; Wang, Chenggong; Irfan, Irfan; Gao, Yongli*
刊名	Organic Electronics
	2014
卷号	15期号:5页码:977-983
关键词	Photoemission spectroscopy Metal oxide insertion layer Oxygen plasma treatment
ISSN号	1566-1199
DOI	10.1016/j.orgel.2014.02.011
URL标识	查看原文
WOS记录号	WOS:000334292900002;EI:20141217474709
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3320562
专题	中南大学
作者单位	1.[Yi, Shijuan 2.Liu, Xiaoliang] Cent S Univ, Coll Phys & Elect, Hunan Key Lab Super Microstruct & Ultrafast Proc, Changsha 410083, Hunan, Peoples R China.
推荐引用方式 GB/T 7714	Liu, Xiaoliang,Yi, Shijuan,Wang, Chenggong,et al. Effect of oxygen plasma treatment on air exposed MoOx thin film[J]. Organic Electronics,2014,15(5):977-983.
APA	Liu, Xiaoliang,Yi, Shijuan,Wang, Chenggong,Irfan, Irfan,&Gao, Yongli*.(2014).Effect of oxygen plasma treatment on air exposed MoOx thin film.Organic Electronics,15(5),977-983.
MLA	Liu, Xiaoliang,et al."Effect of oxygen plasma treatment on air exposed MoOx thin film".Organic Electronics 15.5(2014):977-983.

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