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	Extreme strain rate and temperature dependence of the mechanical properties of nano silicon nitride thin layers in a basal plane under tension: a molecular dynamics study
	Lu, Xuefeng; Wang, Hongjie; Wei, Yin; Wen, Jiangbo; Niu, Min; Jia, Shuhai
刊名	PHYSICAL CHEMISTRY CHEMICAL PHYSICS
	2014
卷号	16期号:[db:dc_citation_issue]页码:15551-15557
ISSN号	1463-9076
DOI	[db:dc_identifier_doi]
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3302749
专题	西安交通大学
推荐引用方式 GB/T 7714	Lu, Xuefeng,Wang, Hongjie,Wei, Yin,et al. Extreme strain rate and temperature dependence of the mechanical properties of nano silicon nitride thin layers in a basal plane under tension: a molecular dynamics study[J]. PHYSICAL CHEMISTRY CHEMICAL PHYSICS,2014,16([db:dc_citation_issue]):15551-15557.
APA	Lu, Xuefeng,Wang, Hongjie,Wei, Yin,Wen, Jiangbo,Niu, Min,&Jia, Shuhai.(2014).Extreme strain rate and temperature dependence of the mechanical properties of nano silicon nitride thin layers in a basal plane under tension: a molecular dynamics study.PHYSICAL CHEMISTRY CHEMICAL PHYSICS,16([db:dc_citation_issue]),15551-15557.
MLA	Lu, Xuefeng,et al."Extreme strain rate and temperature dependence of the mechanical properties of nano silicon nitride thin layers in a basal plane under tension: a molecular dynamics study".PHYSICAL CHEMISTRY CHEMICAL PHYSICS 16.[db:dc_citation_issue](2014):15551-15557.

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