Atomic Layer Deposition of Transparent VOx Thin Films for Resistive Switching Applications | |
Singh, Trilok; Wang, Shuangzhou; Aslam, Nabeel; Zhang, Hehe; Hoffmann-Eifert, Susanne; Mathur, Sanjay | |
刊名 | CHEMICAL VAPOR DEPOSITION
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2014 | |
卷号 | 20期号:[db:dc_citation_issue]页码:291-297 |
关键词 | ALD VOx Thin Films Resistive switching |
ISSN号 | 0948-1907 |
DOI | [db:dc_identifier_doi] |
URL标识 | 查看原文 |
WOS记录号 | [DB:DC_IDENTIFIER_WOSID] |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/3294619 |
专题 | 西安交通大学 |
推荐引用方式 GB/T 7714 | Singh, Trilok,Wang, Shuangzhou,Aslam, Nabeel,et al. Atomic Layer Deposition of Transparent VOx Thin Films for Resistive Switching Applications[J]. CHEMICAL VAPOR DEPOSITION,2014,20([db:dc_citation_issue]):291-297. |
APA | Singh, Trilok,Wang, Shuangzhou,Aslam, Nabeel,Zhang, Hehe,Hoffmann-Eifert, Susanne,&Mathur, Sanjay.(2014).Atomic Layer Deposition of Transparent VOx Thin Films for Resistive Switching Applications.CHEMICAL VAPOR DEPOSITION,20([db:dc_citation_issue]),291-297. |
MLA | Singh, Trilok,et al."Atomic Layer Deposition of Transparent VOx Thin Films for Resistive Switching Applications".CHEMICAL VAPOR DEPOSITION 20.[db:dc_citation_issue](2014):291-297. |
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