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	Atomic Layer Deposition of Transparent VOx Thin Films for Resistive Switching Applications
	Singh, Trilok; Wang, Shuangzhou; Aslam, Nabeel; Zhang, Hehe; Hoffmann-Eifert, Susanne; Mathur, Sanjay
刊名	CHEMICAL VAPOR DEPOSITION
	2014
卷号	20期号:[db:dc_citation_issue]页码:291-297
关键词	ALD VOx Thin Films Resistive switching
ISSN号	0948-1907
DOI	[db:dc_identifier_doi]
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3294619
专题	西安交通大学
推荐引用方式 GB/T 7714	Singh, Trilok,Wang, Shuangzhou,Aslam, Nabeel,et al. Atomic Layer Deposition of Transparent VOx Thin Films for Resistive Switching Applications[J]. CHEMICAL VAPOR DEPOSITION,2014,20([db:dc_citation_issue]):291-297.
APA	Singh, Trilok,Wang, Shuangzhou,Aslam, Nabeel,Zhang, Hehe,Hoffmann-Eifert, Susanne,&Mathur, Sanjay.(2014).Atomic Layer Deposition of Transparent VOx Thin Films for Resistive Switching Applications.CHEMICAL VAPOR DEPOSITION,20([db:dc_citation_issue]),291-297.
MLA	Singh, Trilok,et al."Atomic Layer Deposition of Transparent VOx Thin Films for Resistive Switching Applications".CHEMICAL VAPOR DEPOSITION 20.[db:dc_citation_issue](2014):291-297.

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