A global plasma model for reactive deposition of compound films by modulated pulsed power magnetron sputtering discharges | |
Zheng, B.C.; Wu, Z.L.; Wu, B.; Li, Y.G.; Lei, M.K. | |
刊名 | JOURNAL OF APPLIED PHYSICS |
2017 | |
卷号 | 121 |
ISSN号 | 0021-8979 |
URL标识 | 查看原文 |
WOS记录号 | [DB:DC_IDENTIFIER_WOSID] |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/3283614 |
专题 | 大连理工大学 |
作者单位 | Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian, 116024, China |
推荐引用方式 GB/T 7714 | Zheng, B.C.,Wu, Z.L.,Wu, B.,et al. A global plasma model for reactive deposition of compound films by modulated pulsed power magnetron sputtering discharges[J]. JOURNAL OF APPLIED PHYSICS,2017,121. |
APA | Zheng, B.C.,Wu, Z.L.,Wu, B.,Li, Y.G.,&Lei, M.K..(2017).A global plasma model for reactive deposition of compound films by modulated pulsed power magnetron sputtering discharges.JOURNAL OF APPLIED PHYSICS,121. |
MLA | Zheng, B.C.,et al."A global plasma model for reactive deposition of compound films by modulated pulsed power magnetron sputtering discharges".JOURNAL OF APPLIED PHYSICS 121(2017). |
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