QQ客服 官方微博 反馈留言

	Electron emission properties of cold cathodes based on porous silicon layer processed by electrochemical oxidation and high-pressure water vapor annealing
	Hu, Wenbo; Zhao, Xiaolei; Fan, Jinlong; Wu, Shengli; Zhang, Jingtao
刊名	JOURNAL OF POROUS MATERIALS
	2015
卷号	22期号:[db:dc_citation_issue]页码:761-767
关键词	Cold cathode High-pressure water vapor annealing Electrochemical oxidation Porous silicon
ISSN号	1380-2224
DOI	[db:dc_identifier_doi]
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3265788
专题	西安交通大学
推荐引用方式 GB/T 7714	Hu, Wenbo,Zhao, Xiaolei,Fan, Jinlong,et al. Electron emission properties of cold cathodes based on porous silicon layer processed by electrochemical oxidation and high-pressure water vapor annealing[J]. JOURNAL OF POROUS MATERIALS,2015,22([db:dc_citation_issue]):761-767.
APA	Hu, Wenbo,Zhao, Xiaolei,Fan, Jinlong,Wu, Shengli,&Zhang, Jingtao.(2015).Electron emission properties of cold cathodes based on porous silicon layer processed by electrochemical oxidation and high-pressure water vapor annealing.JOURNAL OF POROUS MATERIALS,22([db:dc_citation_issue]),761-767.
MLA	Hu, Wenbo,et al."Electron emission properties of cold cathodes based on porous silicon layer processed by electrochemical oxidation and high-pressure water vapor annealing".JOURNAL OF POROUS MATERIALS 22.[db:dc_citation_issue](2015):761-767.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。