| Endurance properties of silicon-doped hafnium oxide ferroelectric and antiferroelectric-like thin films: A comparative study and prediction | |
| Liu, Xiaohua; Zhou, Dayu; Guan, Yan; Li, Shuaidong; Cao, Fei; Dong, Xianlin | |
| 刊名 | ACTA MATERIALIA
 |
| 2018 | |
| 卷号 | 154页码:190-198 |
| 关键词 | Hafnium oxide Ferroelectric Antiferroelectric Endurance Phase transition |
| ISSN号 | 1359-6454 |
| URL标识 | 查看原文 |
| WOS记录号 | [DB:DC_IDENTIFIER_WOSID] |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/3261177 |
| 专题 | 大连理工大学 |
| 作者单位 | 1.Dalian Univ Technol, Sch Mat Sci & Engn, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China. 2.Chinese Acad Sci, Shanghai Inst Ceram, Key Lab Inorgan Funct Mat & Devices, Shanghai 200050, Peoples R China. |
| 推荐引用方式 GB/T 7714 | Liu, Xiaohua,Zhou, Dayu,Guan, Yan,et al. Endurance properties of silicon-doped hafnium oxide ferroelectric and antiferroelectric-like thin films: A comparative study and prediction[J]. ACTA MATERIALIA,2018,154:190-198. |
| APA | Liu, Xiaohua,Zhou, Dayu,Guan, Yan,Li, Shuaidong,Cao, Fei,&Dong, Xianlin.(2018).Endurance properties of silicon-doped hafnium oxide ferroelectric and antiferroelectric-like thin films: A comparative study and prediction.ACTA MATERIALIA,154,190-198. |
| MLA | Liu, Xiaohua,et al."Endurance properties of silicon-doped hafnium oxide ferroelectric and antiferroelectric-like thin films: A comparative study and prediction".ACTA MATERIALIA 154(2018):190-198. |
| 个性服务 |
| 查看访问统计 |
| 相关权益政策 |
| 暂无数据 |
| 收藏/分享 |
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。
修改评论