| The bimodal distribution spin Seebeck effect enhancement in epitaxial Ni0.65Zn0.35Al0.8Fe1.2O4 thin film (vol 112, 142406, 2018) | |
| Wang, Hua; Hou, Dazhi; Kikkawa, Takashi; Ramos, Rafael; Shen, Ka; Qiu, Zhiyong; Chen, Yao; Umeda, Maki; Shiomi, Yuki; Jin, Xiaofeng | |
| 刊名 | APPLIED PHYSICS LETTERS
 |
| 2018 | |
| 卷号 | 113 |
| ISSN号 | 0003-6951 |
| URL标识 | 查看原文 |
| WOS记录号 | [DB:DC_IDENTIFIER_WOSID] |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/3260857 |
| 专题 | 大连理工大学 |
| 作者单位 | 1.Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China.,Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China.,Fudan Univ, Collaborat Innovat Ctr Adv Microstruct, Shanghai 200433, Peoples R China. 2.Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan. 3.Tohoku Univ, Adv Inst Mat Res, Sendai, Miyagi 9808577, Japan. 4.Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan. 5.Tohoku Univ, Adv Inst Mat Res, Sendai, Miyagi 9808577, Japan. 6.Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China. 7.Tohoku Univ, Adv Inst Mat Res, Sendai, Miyagi 9808577, Japan. 8.Dalian Univ Technol, Sch Mat Sci & Engn, Minist Educ, Key Lab Mat Modificat Laser Ion & Elect Beams, Dalian 116024, Peoples R China. 9.Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan. 10.Univ Tokyo, Dept Appl Phys, Tokyo 1138656, Japan.,Univ Tokyo, QPEC, Tokyo 1138656, Japan.,RIKEN Ctr Emergent Matter Sci CEMS, Wako, Saitama 3510198, Japan. |
| 推荐引用方式 GB/T 7714 | Wang, Hua,Hou, Dazhi,Kikkawa, Takashi,et al. The bimodal distribution spin Seebeck effect enhancement in epitaxial Ni0.65Zn0.35Al0.8Fe1.2O4 thin film (vol 112, 142406, 2018)[J]. APPLIED PHYSICS LETTERS,2018,113. |
| APA | Wang, Hua.,Hou, Dazhi.,Kikkawa, Takashi.,Ramos, Rafael.,Shen, Ka.,...&Saitoh, Eiji.(2018).The bimodal distribution spin Seebeck effect enhancement in epitaxial Ni0.65Zn0.35Al0.8Fe1.2O4 thin film (vol 112, 142406, 2018).APPLIED PHYSICS LETTERS,113. |
| MLA | Wang, Hua,et al."The bimodal distribution spin Seebeck effect enhancement in epitaxial Ni0.65Zn0.35Al0.8Fe1.2O4 thin film (vol 112, 142406, 2018)".APPLIED PHYSICS LETTERS 113(2018). |
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