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	Thiophene insertion for continuous modulation of the photoelectronic properties of triphenylamine-based metal-organic frameworks for photocatalytic sulfonylation-cyclisation of activated alkenes
	Zhang, Tiexin; Shi, Yusheng; Zhang, Sen; Jia, Chen; He, Cheng; Duan, Chunying
刊名	NEW JOURNAL OF CHEMISTRY
	2018
卷号	42页码:18448-18457
ISSN号	1144-0546
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3250460
专题	大连理工大学
作者单位	1.Dalian Univ Technol, State Key Lab Fine Chem, Dalian 116024, Peoples R China. 2.Dalian Univ Technol, State Key Lab Fine Chem, Dalian 116024, Peoples R China. 3.Collaborat Innovat Ctr Chem Sci & Engn, Tianjin 300071, Peoples R China.
推荐引用方式 GB/T 7714	Zhang, Tiexin,Shi, Yusheng,Zhang, Sen,et al. Thiophene insertion for continuous modulation of the photoelectronic properties of triphenylamine-based metal-organic frameworks for photocatalytic sulfonylation-cyclisation of activated alkenes[J]. NEW JOURNAL OF CHEMISTRY,2018,42:18448-18457.
APA	Zhang, Tiexin,Shi, Yusheng,Zhang, Sen,Jia, Chen,He, Cheng,&Duan, Chunying.(2018).Thiophene insertion for continuous modulation of the photoelectronic properties of triphenylamine-based metal-organic frameworks for photocatalytic sulfonylation-cyclisation of activated alkenes.NEW JOURNAL OF CHEMISTRY,42,18448-18457.
MLA	Zhang, Tiexin,et al."Thiophene insertion for continuous modulation of the photoelectronic properties of triphenylamine-based metal-organic frameworks for photocatalytic sulfonylation-cyclisation of activated alkenes".NEW JOURNAL OF CHEMISTRY 42(2018):18448-18457.

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