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	Atomistic mechanisms of chemical mechanical polishing of diamond (100) in aqueous H2O2/pure H2O: Molecular dynamics simulations using reactive force field (ReaxFF)
	Guo, Xiaoguang; Yuan, Song; Wang, Xiaoli; Jin, Zhuji; Kang, Renke
刊名	COMPUTATIONAL MATERIALS SCIENCE
	2019
卷号	157页码:99-106
关键词	Molecular dynamics ReaxFF CMP Diamond Mechanochemistry
ISSN号	0927-0256
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3220849
专题	大连理工大学
作者单位	Dalian Univ Technol, Key Lab Precis & Nontradit Machining Technol, Minist Educ, Dalian 116024, Peoples R China.
推荐引用方式 GB/T 7714	Guo, Xiaoguang,Yuan, Song,Wang, Xiaoli,et al. Atomistic mechanisms of chemical mechanical polishing of diamond (100) in aqueous H2O2/pure H2O: Molecular dynamics simulations using reactive force field (ReaxFF)[J]. COMPUTATIONAL MATERIALS SCIENCE,2019,157:99-106.
APA	Guo, Xiaoguang,Yuan, Song,Wang, Xiaoli,Jin, Zhuji,&Kang, Renke.(2019).Atomistic mechanisms of chemical mechanical polishing of diamond (100) in aqueous H2O2/pure H2O: Molecular dynamics simulations using reactive force field (ReaxFF).COMPUTATIONAL MATERIALS SCIENCE,157,99-106.
MLA	Guo, Xiaoguang,et al."Atomistic mechanisms of chemical mechanical polishing of diamond (100) in aqueous H2O2/pure H2O: Molecular dynamics simulations using reactive force field (ReaxFF)".COMPUTATIONAL MATERIALS SCIENCE 157(2019):99-106.

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