| The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials | |
| Sun, Jing-Yu; Wen, De-Qi; Zhang, Quan-Zhi; Liu, Yong-Xin; Wang, You-Nian | |
| 刊名 | PHYSICS OF PLASMAS
 |
| 2019 | |
| 卷号 | 26 |
| 关键词 | Copper compounds Electric discharges Electric grounding Electrodes Ionization Plasma simulation Secondary emission Silica Silicon oxides, Asymmetric response Backscattered electrons Capacitively coupled plasmas Grounded electrodes Plasma characteristics Secondary electron emissions Secondary electron yield Secondary electrons, Electrons |
| ISSN号 | 1070-664X |
| URL标识 | 查看原文 |
| WOS记录号 | [DB:DC_IDENTIFIER_WOSID] |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/3216106 |
| 专题 | 大连理工大学 |
| 作者单位 | 1.Dalian Univ Technol, Sch Phys, Dalian 116024, Peoples R China. 2.Michigan State Univ, Dept Elect & Comp Engn, E Lansing, MI 48824 USA. 3.Univ Antwerp, Res Grp PLASMANT, Univ Pl 1, B-2610 Antwerp, Belgium. |
| 推荐引用方式 GB/T 7714 | Sun, Jing-Yu,Wen, De-Qi,Zhang, Quan-Zhi,et al. The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials[J]. PHYSICS OF PLASMAS,2019,26. |
| APA | Sun, Jing-Yu,Wen, De-Qi,Zhang, Quan-Zhi,Liu, Yong-Xin,&Wang, You-Nian.(2019).The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials.PHYSICS OF PLASMAS,26. |
| MLA | Sun, Jing-Yu,et al."The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials".PHYSICS OF PLASMAS 26(2019). |
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