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	Thick SU8 microstructures prepared by broadband UV lithography and the applications in MEMS devices Thick SU8 microstructures prepared by broadband UV lithography and the applications in MEMS devices
	李东玲[1]; 温志渝[1]; 尚正国[1]; 佘引[1]
	2016
页码	182-187
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2973012
专题	重庆大学
推荐引用方式 GB/T 7714	李东玲[1],温志渝[1],尚正国[1],et al. Thick SU8 microstructures prepared by broadband UV lithography and the applications in MEMS devices Thick SU8 microstructures prepared by broadband UV lithography and the applications in MEMS devices[J],2016:182-187.
APA	李东玲[1],温志渝[1],尚正国[1],&佘引[1].(2016).Thick SU8 microstructures prepared by broadband UV lithography and the applications in MEMS devices Thick SU8 microstructures prepared by broadband UV lithography and the applications in MEMS devices.,182-187.
MLA	李东玲[1],et al."Thick SU8 microstructures prepared by broadband UV lithography and the applications in MEMS devices Thick SU8 microstructures prepared by broadband UV lithography and the applications in MEMS devices".(2016):182-187.

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